Osmium Sputtering Targets

Osmium is available as metal and compounds with purities from 99% to 99.999%.

Osmium has the highest melting point and the lowest vapor pressure of any of the platinum group of metals. Osmium tetroxide has recently been used to detect fingerprints and as an aid to stain fatty tissue for microscope slides. The metal is almost entirely used to produce very hard alloys with other metals of the platinum group. Osmium is available as metal and compounds with purities from 99% to 99.999%.

  

 Osmium is a Block D, Group 8, Period 6 element. The number of electrons in each of Osmium's shells is 2, 8, 18, 32, 14, 2 and its electronic configuration is [Xe] 4f14 5d6 6s2. In its elemental form osmium's CAS number is 7440-04-2. The osmium atom has a radius of 133.8.pm and it's Van der Waals radius is 200.pm. Osmium tetroxide (OsO4) can cause eye, lung and skin damage which makes it very toxic.

 

All elemental metals, compounds and solutions may be synthesized in ultra high purity (e.g. 99.999%) for laboratory standards, advanced electronic, thin fillm deposition using sputtering targets and evaporation materials, metallurgy and optical materials and other high technology applications. Information is provided for stable (non-radioactive) isotopes. Organo-Metallic Osmium compounds are soluble in organic or non-aqueous solvents. See Analytical Services for information on available certified chemical and physical analysis techniques including MS-ICP, X-Ray Diffraction, PSD and Surface Area (BET) analysis.  

Osmium Sputtering Targets